Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing

Georges Nehmetallah; Partha Banerjee; Jed Khoury

doi:10.1117/12.2176427

20 April 2015 Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing

Georges Nehmetallah, Partha Banerjee, Jed Khoury

Author Affiliations +

Proceedings Volume 9477, Optical Pattern Recognition XXVI; 94770B (2015) https://doi.org/10.1117/12.2176427
Event: SPIE Defense + Security, 2015, Baltimore, MD, United States

Abstract

The nonlinearity inherent in four-wave mixing in photorefractive (PR) materials is used for adaptive filtering. Examples include script enhancement on a periodic pattern, scratch and defect cluster enhancement, periodic pattern dislocation enhancement, etc. through intensity filtering image manipulation. Organic PR materials have large space-bandwidth product, which makes them useful in adaptive filtering techniques in quality control systems. For instance, in the case of edge enhancement, phase conjugation via four-wave mixing suppresses the low spatial frequencies of the Fourier spectrum of an aperiodic image and consequently leads to image edge enhancement. In this work, we model, numerically verify, and simulate the performance of a four wave mixing setup used for edge, defect and pattern detection in periodic amplitude and phase structures. The results show that this technique successfully detects the slightest defects clearly even with no enhancement. This technique should facilitate improvements in applications such as image display sharpness utilizing edge enhancement, production line defect inspection of fabrics, textiles, e-beam lithography masks, surface inspection, and materials characterization.

Citation Download Citation

Georges Nehmetallah, Partha Banerjee, and Jed Khoury "Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing", Proc. SPIE 9477, Optical Pattern Recognition XXVI, 94770B (20 April 2015); https://doi.org/10.1117/12.2176427

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available