Paper
16 January 1989 An Interpretation Of Moire Tnterferometry From Wavefront Interference Theory
Fu-long Dai, James McKelvie, Daniel Post
Author Affiliations +
Proceedings Volume 0954, Optical Testing and Metrology II; (1989) https://doi.org/10.1117/12.947581
Event: SPIE International Symposium on Optical Engineering and Industrial Sensing for Advance Manufacturing Technologies, 1988, Dearborn, MI, United States
Abstract
The process of moire interferometry is given mathematical description in terms of the classical theory of optical interference. The governing relationship between displacement and fringe order is derived, and the analysis is extended to cover carrier patterns, double exposure methods, and initial fringe pattern elimination. Various processes for obtaining patterns of displacement derivatives are also described mathematically.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fu-long Dai, James McKelvie, and Daniel Post "An Interpretation Of Moire Tnterferometry From Wavefront Interference Theory", Proc. SPIE 0954, Optical Testing and Metrology II, (16 January 1989); https://doi.org/10.1117/12.947581
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Cited by 2 scholarly publications.
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KEYWORDS
Wavefronts

Deflectometry

Diffraction gratings

Fringe analysis

Moire patterns

Optical testing

Diffraction

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