Effect of major factors on damage threshold of optical rectification crystals

Qinglong Meng; Zhuolin Su; Junli Yu; Bin Zhang

doi:10.1117/12.2187644

2 September 2015 Effect of major factors on damage threshold of optical rectification crystals

Qinglong Meng, Zhuolin Su, Junli Yu, Bin Zhang

Proceedings Volume 9573, Optomechanical Engineering 2015; 957305 (2015) https://doi.org/10.1117/12.2187644
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

The optical rectification crystals would be damaged under the high-power femtosecond laser radiation during the generation of terahertz radiation in optical rectification, limiting the further increase of the intensity and energy conversion efficiency of terahertz radiation. In this paper, the interaction mechanism between the femtosecond laser pulse and optical rectification crystals has been analyzed and the prediction model of damage threshold of LiNbO3 crystal under femtosecond laser has also been built up. On the basis, the evolution of free electron in crystal material has been discussed in detail, and the influence of the major parameters of the femtosecond laser on the damage threshold has been analyzed quantitatively. The results show that, the density of generated free electron increases with the increasing of the intensity and the pulse duration of femtosecond laser. For the given intensity of femtosecond laser, the damage threshold of the LiNbO₃ crystal increases with the increasing of the pulse duration. The results for the damage threshold are consistent quite well with the experimental data reported in the literature.

Citation Download Citation

Qinglong Meng, Zhuolin Su, Junli Yu, and Bin Zhang "Effect of major factors on damage threshold of optical rectification crystals", Proc. SPIE 9573, Optomechanical Engineering 2015, 957305 (2 September 2015); https://doi.org/10.1117/12.2187644

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