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11 October 2015 Systematic error analysis for 3D nanoprofiler tracing normal vector
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Proceedings Volume 9633, Optifab 2015; 96331B (2015)
Event: SPIE Optifab, 2015, Rochester, New York, United States
In recent years, demand for an optical element having a high degree of freedom shape is increased. High-precision aspherical shape is required for the X-ray focusing mirror etc. For the head-mounted display etc., optical element of the free-form surface is used. For such an optical device fabrication, measurement technology is essential. We have developed a high- precision 3D nanoprofiler. By nanoprofiler, the normal vector information of the sample surface is obtained on the basis of the linearity of light. Normal vector information is differential value of the shape, it is possible to determine the shape by integrating. Repeatability of sub-nanometer has been achieved by nanoprofiler. To pursue the accuracy of shapes, systematic error is analyzed. The systematic errors are figure error of sample and assembly errors of the device. This method utilizes the information of the ideal shape of the sample, and the measurement point coordinates and normal vectors are calculated. However, measured figure is not the ideal shape by the effect of systematic errors. Therefore, the measurement point coordinate and the normal vector is calculated again by feeding back the measured figure. Correction of errors have been attempted by figure re-derivation. It was confirmed theoretically effectiveness by simulation. This approach also applies to the experiment, it was confirmed the possibility of about 4 nm PV figure correction in the employed sample.
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Ryota Kudo, Yusuke Tokuta, Motohiro Nakano, Kazuya Yamamura, and Katsuyoshi Endo "Systematic error analysis for 3D nanoprofiler tracing normal vector", Proc. SPIE 9633, Optifab 2015, 96331B (11 October 2015);

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