Based on the unresolved pattern inspection capability study using DUV mask inspection tool NPI-7000 for 14nm/10nm technology nodes, we developed a new optical imaging method and tested its inspection capability for the minute pattern smaller than the optical resolution. We confirmed the excellent defect detection capability and the expendability of DUV optics inspection using the new inspection method. Here, the inspection result of unresolved hp26/20nm pattern obtained by NPI-7000 with the new inspection method is descried. |
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CITATIONS
Cited by 2 scholarly publications.
Inspection
Deep ultraviolet
Optical inspection
Photomasks
Nanoimprint lithography
Optical resolution
Extreme ultraviolet