Paper
9 November 2015 Phase imaging results of phase defect using micro coherent EUV scatterometry microscope
Author Affiliations +
Abstract
To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140-nm focus diameter on the defect using a Fresnel zoneplate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect is reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defect were well reconstructed quantitatively. The micro-CSM is very powerful tool to review an EUV phase defect.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, and Takeo Watanabe "Phase imaging results of phase defect using micro coherent EUV scatterometry microscope", Proc. SPIE 9635, Photomask Technology 2015, 96351E (9 November 2015); https://doi.org/10.1117/12.2205304
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Diffraction

Microscopes

CCD cameras

Photomasks

Extreme ultraviolet lithography

Reconstruction algorithms

Back to Top