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This paper investigates a pattern contour based solution for 2D structure performance evaluation. The basic contours of GDS and CD-SEM image are extracted, overlapped and processed and then the edge roughness of SEM contour and the bias between the above two kinds of contour are adopted on 2D individual pattern performance’s statistics. By utilizing this solution, the 2D pattern quality can be described quantitatively as two main aspects, shape and size with the results of edge roughness and bias. Generalize this solution, the 2D pattern’s uniformity, mean size, or other performances, can be evaluated quantitatively in the similar way as well. This solution calculation bases on pattern contour, therefore the measure pattern is not restricted by its shape. |
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Critical dimension metrology
Photomasks
Scanning electron microscopy
Edge roughness
Metrology
Image processing
Printing
