Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Daniel Chalom; Jan Klikovits; David Geist; Peter Hudek; Stefan Eder-Kapl; Mehdi Daneshpanah; Frank Laske; Stefan Eyring; Klaus-Dieter Roeth

doi:10.1117/12.2196388

9 July 2015 Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Daniel Chalom, Jan Klikovits, David Geist, Peter Hudek, Stefan Eder-Kapl, Mehdi Daneshpanah, Frank Laske, Stefan Eyring, Klaus-Dieter Roeth

Author Affiliations +

Proceedings Volume 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII; 965805 (2015) https://doi.org/10.1117/12.2196388
Event: Photomask Japan 2015, 2015, Yokohama, Japan

Abstract

Reticles for manufacturing upcoming 10nm and 7nm Logic devices will become very complex, no matter whether 193nm water immersion lithography will continue as main stream production path or EUV lithography will be able to take over volume production of critical layers for the 7nm node. The economic manufacturing of future masks for 193i, EUV and imprint lithography with further increasing complexity drives the need for multi-beam mask writing as this technology can overcome the influence of complexity on write time of today’s common variable shape beam writers. Local registration of the multi-beam array is a critical component which greatly differs from variable shape beam systems. In this paper we would like to present the local registration performance of the IMS Multi-Beam Mask Writer system and the metrology tools that enable the characterization optimization.

Citation Download Citation

Daniel Chalom, Jan Klikovits, David Geist, Peter Hudek, Stefan Eder-Kapl, Mehdi Daneshpanah, Frank Laske, Stefan Eyring, and Klaus-Dieter Roeth "Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer", Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 965805 (9 July 2015); https://doi.org/10.1117/12.2196388

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available