YieldStar based reticle 3D measurements and its application

Vidya Vaenkatesan; Twan Schellekens; Natalia Davydova; Harm Dillen; Joep van Dijk

doi:10.1117/12.2196665

4 September 2015 YieldStar based reticle 3D measurements and its application

Vidya Vaenkatesan, Twan Schellekens, Natalia Davydova, Harm Dillen, Joep van Dijk

Proceedings Volume 9661, 31st European Mask and Lithography Conference; 96610N (2015) https://doi.org/10.1117/12.2196665
Event: 31st European Mask and Lithography Conference, 2015, Eindhoven, Netherlands

Abstract

YieldStar (YS) is an ASML-built scatterometry tool with well-established capability to measure wafer Critical Dimension (CD), Overlay and Focus. In a feasibility study, the application range of YS was extended to measure CD patterns in EUV reticles (absorber CD, height, Side Wall Angle-SWA). The measured data compared well with the available data from CD-SEM and AFM. Further the YS measured data was used to mathematically separate the reticle induced fingerprint from the scanner fingerprint.

Citation Download Citation

Vidya Vaenkatesan, Twan Schellekens, Natalia Davydova, Harm Dillen, and Joep van Dijk "YieldStar based reticle 3D measurements and its application", Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610N (4 September 2015); https://doi.org/10.1117/12.2196665

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