Paper
6 November 2015 Method for the measurement of surface-relief grating’s profile using initial phase of diffraction wave
Fanrong Feng, Jianhong Wu, Fei Gao
Author Affiliations +
Proceedings Volume 9667, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors; 96670B (2015) https://doi.org/10.1117/12.2197989
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2015, Suzhou, China
Abstract
The analysis of initial phase of diffraction wave of grating mask is based on rigorous coupled-wave analysis method. In this paper, the general diffraction analysis numerical code based on the rigorous coupled-wave analysis (RCWA) is written by MATLAB software to calculate the 0th refraction wave of grating mask. Since large measurement errors will occur while measuring the grove shape by AFM, the method of measuring the initial phase of diffraction wave was proposed and the feasibility of this method has also been verified.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fanrong Feng, Jianhong Wu, and Fei Gao "Method for the measurement of surface-relief grating’s profile using initial phase of diffraction wave", Proc. SPIE 9667, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors, 96670B (6 November 2015); https://doi.org/10.1117/12.2197989
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diffraction gratings

Diffraction

Photoresist materials

Atomic force microscopy

Dielectrics

Ion beams

Scanning electron microscopy

Back to Top