Control of lateral thickness gradients of EUV/soft x-ray multilayer on curved substrates

Bo Yu; Chun-shui Jin; Shun Yao

doi:10.1117/12.2246160

25 October 2016 Control of lateral thickness gradients of EUV/soft x-ray multilayer on curved substrates

Bo Yu, Chun-shui Jin, Shun Yao

Proceedings Volume 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics; 96870A (2016) https://doi.org/10.1117/12.2246160
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

To meet the requirements of wavelength matching and figure preservation for EUV multilayer optics, study of precise control of the lateral thickness gradients of multilayer was performed. The distribution of the magnetron sputtering source was derived by fitting the coating thickness profiles of flat substrates sweeping across the source with constant velocity at different heights using genetic algorithm. Then, genetic algorithm was also used in finding the proper speed profiles for the desired thickness profiles. By the method mentioned above, extremely precise control of the lateral thickness gradients of multilayer on curved substrates was realized.

Citation Download Citation

Bo Yu, Chun-shui Jin, and Shun Yao "Control of lateral thickness gradients of EUV/soft x-ray multilayer on curved substrates", Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 96870A (25 October 2016); https://doi.org/10.1117/12.2246160

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