Paper
22 April 2016 Oxygen assisted iodine atoms production in an RF discharge
Pavel A. Mikheyev, Andrey V. Demyanov, Nikolay I. Ufimtsev, Igor V. Kochetov, Valeriy N. Azyazov, Anatoly P. Napartovich, Michael C. Heaven
Author Affiliations +
Abstract
Experiments and modeling of CH3I dissociation in the plasma generated by a 40 MHz RF discharge were performed. A discharge chamber of an original design, consisting of quartz tubes between two planar electrodes, permitted the production of iodine atoms with number densities up to 2×1016 cm-3. In this discharge chamber, contamination of the walls of the tubes did not hinder discharge stability, providing a good iodine production rate. Addition of oxygen into Ar:CH3I mixture resulted in a substantial increase in iodine extraction efficiency. When the discharge power reached 200 W, complete CH3I dissociation in a Ar:CH3I:O2 mixture was observed. The fraction of discharge power spent on iodine atom production at a 0.17 mmol/s CH3I flow rate was 16%.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pavel A. Mikheyev, Andrey V. Demyanov, Nikolay I. Ufimtsev, Igor V. Kochetov, Valeriy N. Azyazov, Anatoly P. Napartovich, and Michael C. Heaven "Oxygen assisted iodine atoms production in an RF discharge", Proc. SPIE 9729, High Energy/Average Power Lasers and Intense Beam Applications IX, 97290H (22 April 2016); https://doi.org/10.1117/12.2218350
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KEYWORDS
Iodine

Chemical species

Oxygen

Electrodes

Argon

Plasma

Contamination

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