Our second interest is the applicability of 4f methods to high-power applications. We discuss the variants of 4f intensity shaping by phase modulation from a system-level point of view which requires the consideration of application relevant boundary conditions. The discussion includes i) the micro mirror based phase manipulation combined with amplitude masking in the Fourier plane, ii) the Generalized Phase Contrast, and iii) matched phase-only correlation filtering combined with GPC. The conceptual comparison relies on comparative figures of merit for energy efficiency, pattern homogeneity, pattern image quality, maximum output intensity and flexibility with respect to the displayable pattern. Numerical simulations illustrate our findings.
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