Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface

Kazuya Yamamoto; Toshimitsu Takaoka; Hidetoshi Fukui; Yasuyuki Haruta; Tomoya Yamashita; Seiichiro Kitagawa

doi:10.1117/12.2213776

4 March 2016 Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface

Kazuya Yamamoto, Toshimitsu Takaoka, Hidetoshi Fukui, Yasuyuki Haruta, Tomoya Yamashita, Seiichiro Kitagawa

Author Affiliations +

Proceedings Volume 9742, Physics and Simulation of Optoelectronic Devices XXIV; 974221 (2016) https://doi.org/10.1117/12.2213776
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

In general, thin-film coating process is widely applied on optical lens surface as anti-reflection function. In normal production process, at first lens is manufactured by molding, then anti-reflection is added by thin-film coating. In recent years, instead of thin-film coating, sub-wavelength structures adding on surface of molding die are widely studied and development to keep anti-reflection performance. As merits, applying sub-wavelength structure, coating process becomes unnecessary and it is possible to reduce man-hour costs. In addition to cost merit, these are some technical advantages on this study. Adhesion of coating depends on material of plastic, and it is impossible to apply anti-reflection function on arbitrary surface. Sub-wavelength structure can solve both problems. Manufacturing method of anti-reflection structure can be divided into two types mainly. One method is with the resist patterning, and the other is mask-less method that does not require patterning.

What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.

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Kazuya Yamamoto, Toshimitsu Takaoka, Hidetoshi Fukui, Yasuyuki Haruta, Tomoya Yamashita, and Seiichiro Kitagawa "Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface", Proc. SPIE 9742, Physics and Simulation of Optoelectronic Devices XXIV, 974221 (4 March 2016); https://doi.org/10.1117/12.2213776

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KEYWORDS

Etching

Coating

Manufacturing

Ions

Reactive ion etching

Thin film coatings

Thin films

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