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14 March 2016 Black silicon-based infrared radiation source
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Proceedings Volume 9752, Silicon Photonics XI; 97520E (2016) https://doi.org/10.1117/12.2211668
Event: SPIE OPTO, 2016, San Francisco, California, United States
Abstract
Micromachined infrared sources are enabling component for interferometric and spectroscopic sensors. Their compact size and low cost transform bulky instruments to the sensor scale, which is needed for a wide range of applications in the conventional and unconventional environments. The silicon micromachined sources should be engineered to have good emissivity across a large wavelength range because the intrinsic emissivity of silicon is low. This optimization was reported in literature by either the deposition of black metal at the surface of an emitter or the use of deep phonic crystal cavities, which complicates the fabrication technology and results in sharp dip lines in the spectral emissivity, respectively. In this work we report a micromachined infrared radiation source based on a heater on the top of black silicon structure for the first time in the literature, up to the authors’ knowledge. The temperature of the device is characterized versus the applied voltage and the radiated spectrum is captured in the 1300 nm to 2500 nm spectral range; limited by the spectrum analysis instrument. The reported source opens the doors for completely integrated MEMS spectral sensors onchip.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Momen Anwar, Yasser Sabry, Philippe Basset, Frédéric Marty, Tarik Bourouina, and Diaa Khalil "Black silicon-based infrared radiation source", Proc. SPIE 9752, Silicon Photonics XI, 97520E (14 March 2016); https://doi.org/10.1117/12.2211668
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