Lens array fabrication method with volume expansion property of PDMS

WonJae Jang; Junoh Kim; Muyoung Lee; Jooho Lee; Yousung Bang; Yong Hyub Won

doi:10.1117/12.2212023

14 March 2016 Lens array fabrication method with volume expansion property of PDMS

WonJae Jang, Junoh Kim, Muyoung Lee, Jooho Lee, Yousung Bang, Yong Hyub Won

Proceedings Volume 9759, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX; 97591F (2016) https://doi.org/10.1117/12.2212023
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

Conventionally, poly (dimethylsiloxane) lens array is fabricated by replica molding. In this paper, we describe simple method for fabricating lens array with expanding property of PDMS. The PDMS substrate is prepared by spin coating on cleaned glass. After spin coating PDMS, substrate is treated with O2 plasma to promote adhesion between PDMS substrate and photoresist pattern on it. Positive photoresist az-4330 and AZ 430K developer is used for patterning on PDMS. General photolithography process is used to patterning. Then patterned PDMS substrate is dipped to 1- Bromododecane bath. During this process, patterned photoresist work as a barrier and prevent blocked PDMS substrate from reaction with 1-Bromododecane. Unblocked part of PDMS directly react with 1-Bromododecane and results in expanded PDMS volume. The expansion of PDMS is depends on absorbed 1-Bromododecane volume, dipping time and ratio of block to open area. The focal length of lens array is controlled by those PDMS expansion factors. Scale of patterned photoresist determine a diameter of each lens. The expansion occurs symmetrically at center of unblocked PDMS and 1-Bromododecane interface. As a result, the PDMS lens array is achieved by this process.

Citation Download Citation

WonJae Jang, Junoh Kim, Muyoung Lee, Jooho Lee, Yousung Bang, and Yong Hyub Won "Lens array fabrication method with volume expansion property of PDMS", Proc. SPIE 9759, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX, 97591F (14 March 2016); https://doi.org/10.1117/12.2212023

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KEYWORDS

Photoresist materials

Metals

Glasses

Photomasks

Optical lithography

Coating

Lithography

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