Controlling the parameters of wet lateral oxidation for VCSEL fabrication

Majid Riaziat; David Reed; Alex Kor

doi:10.1117/12.2214506

4 March 2016 Controlling the parameters of wet lateral oxidation for VCSEL fabrication

Majid Riaziat, David Reed, Alex Kor

Proceedings Volume 9766, Vertical-Cavity Surface-Emitting Lasers XX; 97660H (2016) https://doi.org/10.1117/12.2214506
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

Physical parameters that need to be controlled during the wet oxidation of VCSEL mesas are numerous and include: temperature uniformity, vapor flow pattern, epitaxial thickness and composition uniformity, diffusion through adjacent layers, oxidation onset delay, etch skirt, and wafer surface prep. We report the results of our studies on some of these factors including vapor flow patterns, and oxidation front monitoring. The results are being used for the optimization of our commercial system for wet lateral oxidation.

Citation Download Citation

Majid Riaziat, David Reed, and Alex Kor "Controlling the parameters of wet lateral oxidation for VCSEL fabrication", Proc. SPIE 9766, Vertical-Cavity Surface-Emitting Lasers XX, 97660H (4 March 2016); https://doi.org/10.1117/12.2214506

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available