Modeling and parameter tuning for templated directed self-assembly

B. Meliorisz; T. Mülders; H.-J. Stock; S. Marokkey; W. Demmerle; K. Lai; A. Raghunathan; P. Dhagat

doi:10.1117/12.2219158

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22 March 2016 Modeling and parameter tuning for templated directed self-assembly

B. Meliorisz, T. Mülders, H.-J. Stock, S. Marokkey, W. Demmerle, K. Lai, A. Raghunathan, P. Dhagat

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Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97770Z (2016) https://doi.org/10.1117/12.2219158
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we study the impact of topographic guide or template properties on pattern formation in a directed self-assembly (DSA) process. In particular, we investigate the relationship between free energy and defect generation or process robustness, and analyze the influence of guide affinity. The good correlation between experimental and simulation results confirms the role of certain setup parameters and process conditions on the DSA patterning.

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B. Meliorisz, T. Mülders, H.-J. Stock, S. Marokkey, W. Demmerle, K. Lai, A. Raghunathan, and P. Dhagat "Modeling and parameter tuning for templated directed self-assembly", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770Z (22 March 2016); https://doi.org/10.1117/12.2219158

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