Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers

Yung-Chiang Ting; Shyi-Long Shy

doi:10.1117/12.2218594

1 April 2016 Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97771H (2016) https://doi.org/10.1117/12.2218594
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Nano-imprinting lithography (NIL) technology, as one of the most promising fabrication technologies, has been demonstrated to be a powerful tool for large-area replication up to wafer-level, with features down to nanometer scale. The cost of resists used for NIL is important for wafer-level large-area replication. This study aims to develop capabilities in patterning larger area structure using thermal NIL. The commercial available Poly (Methyl Methacrylate) (PMMA) and Polystyrene (PS) polymers possess a variety of characteristics desirable for NIL, such as low material cost, low bulkvolumetric shrinkage, high spin coating thickness uniformity, high process stability, and acceptable dry-etch resistance. PMMA materials have been utilized for positive electron beam lithography for many years, offering high resolution capability and wide process latitude. In addition, it is preferable to have a negative resist like PMMA, which is a simple polymer with low cost and practically unlimited shelf life, and can be dissolved easily using commercial available Propylene glycol methyl ether acetate (PGMEA) safer solvent to give the preferred film thickness. PS is such a resist, as it undergoes crosslinking when exposed to deep UV light or an electron beam and can be used for NIL. The result is a cost effective patterning larger area structure using thermal nano-imprint lithography (NIL) by using commercial available PMMA and PS ploymers as NIL resists.

Citation Download Citation

Yung-Chiang Ting and Shyi-Long Shy "Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771H (1 April 2016); https://doi.org/10.1117/12.2218594

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available