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24 March 2016 Focus control enhancement and on-product focus response analysis methodology
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With decreasing CDOF (Critical Depth Of Focus) for 20/14nm technology and beyond, focus errors are becoming increasingly critical for on-product performance. Current on product focus control techniques in high volume manufacturing are limited; It is difficult to define measurable focus error and optimize focus response on product with existing methods due to lack of credible focus measurement methodologies. Next to developments in imaging and focus control capability of scanners and general tool stability maintenance, on-product focus control improvements are also required to meet on-product imaging specifications. In this paper, we discuss focus monitoring, wafer (edge) fingerprint correction and on-product focus budget analysis through diffraction based focus (DBF) measurement methodology. Several examples will be presented showing better focus response and control on product wafers. Also, a method will be discussed for a focus interlock automation system on product for a high volume manufacturing (HVM) environment.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young Ki Kim, Yen-Jen Chen, Xueli Hao, Pavan Samudrala, Juan-Manuel Gomez, Mark O. Mahoney, Ferhad Kamalizadeh, Justin K. Hanson, Shawn Lee, and Ye Tian "Focus control enhancement and on-product focus response analysis methodology", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780T (24 March 2016);

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