Comparison of left and right side line edge roughness in lithography

Lei Sun; Nicole Saulnier; Genevieve Beique; Erik Verduijn; Wenhui Wang; Yongan Xu; Hao Tang; Yulu Chen; Ryoung-han Kim; John Arnold; Nelson Felix; Matthew Colburn

doi:10.1117/12.2219665

18 March 2016 Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, Matthew Colburn

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 977822 (2016) https://doi.org/10.1117/12.2219665
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The left side and right side line edge roughnesses (LER) of a line are compared for different conditions, such as through pitch, through critical dimension (CD), from horizontal to vertical line direction, from litho to etch. The investigation shows that the left and right side LER from lithography process are the same, however, the metrology can cause a 4-25% increase in the measured right side LER. The LER difference is related to the CDSEM e-beam scan direction.

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Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, and Matthew Colburn "Comparison of left and right side line edge roughness in lithography", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977822 (18 March 2016); https://doi.org/10.1117/12.2219665

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