Process window optimizer for pattern based defect prediction on 28nm metal layer

P. Fanton; R. La Greca; V. Jain; C. Prentice; J.-G. Simiz; S. Hunsche; B. Le-Gratiet; L. Depre

doi:10.1117/12.2220295

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8 March 2016 Process window optimizer for pattern based defect prediction on 28nm metal layer

P. Fanton, R. La Greca, V. Jain, C. Prentice, J.-G. Simiz, S. Hunsche, B. Le-Gratiet, L. Depre

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Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97782O (2016) https://doi.org/10.1117/12.2220295
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

At the 28nm technology node and below, hot spot prediction and process window control across production wafers have become increasingly critical. We establish proof off concept for ASML’s holistic lithography hot spot detection and defect monitoring flow, process window optimizer (PPWO), for a 228nm metal layer process. We demonstrate prediction and verification of defect occurrence on wafer that arise from focus variations exceeding process window margins of device hotspots. We also estimate the improvement potential if design aware scanner control was applied.

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P. Fanton, R. La Greca, V. Jain, C. Prentice, J.-G. Simiz, S. Hunsche, B. Le-Gratiet, and L. Depre "Process window optimizer for pattern based defect prediction on 28nm metal layer", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97782O (8 March 2016); https://doi.org/10.1117/12.2220295

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