Metrology target design simulations for accurate and robust scatterometry overlay measurements

Guy Ben-Dov; Inna Tarshish-Shapir; David Gready; Mark Ghinovker; Mike Adel; Eitan Herzel; Soonho Oh; DongSub Choi; Sang Hyun Han; Mohamed El Kodadi; Chan Hwang; Jeongjin Lee; Seung Yoon Lee; Kuntack Lee

doi:10.1117/12.2219108

8 March 2016 Metrology target design simulations for accurate and robust scatterometry overlay measurements

Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, Kuntack Lee

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97783B (2016) https://doi.org/10.1117/12.2219108
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Overlay metrology target design is an essential step prior to performing overlay measurements. This step is done through the optimization of target parameters for a given process stack. A simulation tool is therefore used to improve measurement performances. This work shows how our Metrology Target Design (MTD) simulator helps significantly in the target design process. We show the role of film and Optical CD measurements in improving significantly the fidelity of the simulations. We demonstrate that for various target design parameters we are capable of predicting measured performance metrics by simulations and correctly rank various designs performances.

Citation Download Citation

Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, and Kuntack Lee "Metrology target design simulations for accurate and robust scatterometry overlay measurements", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97783B (8 March 2016); https://doi.org/10.1117/12.2219108

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