Positive tone oxide nanoparticle EUV (ONE) photoresists

Mufei Yu; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2218900

21 March 2016 Positive tone oxide nanoparticle EUV (ONE) photoresists

Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 977905 (2016) https://doi.org/10.1117/12.2218900
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Nanoparticles with a variety of organic/inorganic combinations have been investigated and the negative tone patterning was demonstrated using EUV radiation. Zirconium methacrylate (ZrMAA) nanoparticles had sensitivity with EUV exposure as high as 4.2 mJ/cm² with a resolution up to 22 nm, and an LER of 5.6 nm. Meanwhile, the dual-tone behavior of ZrMAA photoresists using e-beam and deep UV exposures is another attractive feature of the nanoparticle photoresists, which may be further applied with EUV lithography. The current study investigates the positive tone patterning of ZrMAA and the process-dependent image reversal. Our proposed patterning mechanism is further illustrated and optimized based in a positive tone behavior study.

Citation Download Citation

Mufei Yu, Emmanuel P. Giannelis, and Christopher K. Ober "Positive tone oxide nanoparticle EUV (ONE) photoresists", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977905 (21 March 2016); https://doi.org/10.1117/12.2218900

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