Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools

Matthias Rudolph; Silvio Esche; Christoph Hohle; Dirk Schumann; Philipp Steinke; Xaver Thrun; Justus von Sonntag

doi:10.1117/12.2220156

21 March 2016 Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools

Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, Justus von Sonntag

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 977919 (2016) https://doi.org/10.1117/12.2220156
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The application of phasefluid based intelligent fluids® in the field of photoresist stripping was studied. Due to their highly dynamic inner structure, phasefluids penetrate into the polymer network of photoresists and small gaps between resist layer and substrate and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their efficiency in various resist stripping applications including initial results on copper metallization. Furthermore intelligent fluids® have been evaluated on an industry standard high volume single wafer cleaner. A baseline process on 300 mm wafers has been developed and characterized in terms of metallic and ionic impurities and defect level. Finally a general proof of concept for removal of positive tone resist from 300 mm silicon wafers is demonstrated.

Citation Download Citation

Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, and Justus von Sonntag "Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977919 (21 March 2016); https://doi.org/10.1117/12.2220156

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