Optics-free lithography on colloidal nanocrystal assemblies

Santosh Shaw; Kyle J. Miller; Julien L. Colaux; Ludovico Cademartiri

doi:10.1117/12.2218792

21 March 2016 Optics-free lithography on colloidal nanocrystal assemblies

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, Ludovico Cademartiri

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 97791J (2016) https://doi.org/10.1117/12.2218792
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

We describe a lithographic approach – Nanocrystal Plasma Polymerization (NPP)-based lithography (Figure 1) – where colloidal nanocrystal assemblies (CNAs) are used as the resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs are redispersed leaving behind the patterned area.

Citation Download Citation

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, and Ludovico Cademartiri "Optics-free lithography on colloidal nanocrystal assemblies", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97791J (21 March 2016); https://doi.org/10.1117/12.2218792

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