Filtration on block copolymer solution used in directed self assembly lithography

Toru Umeda; Tomoyuki Takakura; Shuichi Tsuzuki

doi:10.1117/12.2219423

25 March 2016 Filtration on block copolymer solution used in directed self assembly lithography

Toru Umeda, Tomoyuki Takakura, Shuichi Tsuzuki

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 977921 (2016) https://doi.org/10.1117/12.2219423
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we presented the filtration effects on block copolymers (BCP) that are commonly used in directed self-assembly lithographic (DSAL) imaging schemes. Specifically we focused on filtration effects on micro-contaminants such as metal ions and metal induced gels.

Gel removal efficiency studies carried out with HDPE, Nylon and PTFE filters pointed out that Nylon 6,6 membrane is the most effective in removing gels in block copolymer (BCP) solutions.

Metal removal efficiency studies were conducted using multistep filtrations such as repetitive filtration of single membrane material and combination of different type of membranes. Results showed that a combination of Nylon-6,6 and ion-exchange filters is highly effective in reducing metals such as Li, Mg and Al to > 99.99% efficiency. The mechanism of metal removal efficiency is discussed in detail.

Citation Download Citation

Toru Umeda, Tomoyuki Takakura, and Shuichi Tsuzuki "Filtration on block copolymer solution used in directed self assembly lithography", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977921 (25 March 2016); https://doi.org/10.1117/12.2219423

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