Advanced DFM application for automated bit-line pattern dummy

Tae Hyun Shin; Cheolkyun Kim; Hyunjo Yang; Mohamed Bahr

doi:10.1117/12.2220276

16 March 2016 Advanced DFM application for automated bit-line pattern dummy

Tae Hyun Shin, Cheolkyun Kim, Hyunjo Yang, Mohamed Bahr

Proceedings Volume 9781, Design-Process-Technology Co-optimization for Manufacturability X; 978114 (2016) https://doi.org/10.1117/12.2220276
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

This paper presents an automated DFM solution to generate Bit Line Pattern Dummy (BLPD) for memory devices. Dummy shapes are aligned with memory functional bits to ensure uniform and reliable memory device. This paper will present a smarter approach that uses an analysis based technique for adding the dummy shapes that have different types according to the space available. Experimental results based on layout of Mobile dynamic random access memory (DRAM).

Citation Download Citation

Tae Hyun Shin, Cheolkyun Kim, Hyunjo Yang, and Mohamed Bahr "Advanced DFM application for automated bit-line pattern dummy", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978114 (16 March 2016); https://doi.org/10.1117/12.2220276

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