Paper
5 November 2015 Vertical coupling and polarization-independent subwavelength grating beam splitter based on silicon-on-insulator
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Proceedings Volume 9795, Selected Papers of the Photoelectronic Technology Committee Conferences held June–July 2015; 979531 (2015) https://doi.org/10.1117/12.2209534
Event: Selected Proceedings of the Photoelectronic Technology Committee Conferences held June-July 2015, 2015, Hefei, Suzhou, and Harbin, China
Abstract
We describe a novel beam splitter with advantages of a single-layer, compact and vertical coupling structure, which is based on Bragg diffraction conditions and phase match equation. FDTD method is used to optimize the design of beam splitter. The result of simulation shows that both polarizations incident light are separated into two beams of nearly equal power (near 43% split and 45% split, respectively), which are coupled into opposite directions in the waveguide. For TE mode, the coupling efficiency of the right direction and the left direction are 42.54% and 43.68, respectively. That of TM mode is 46.03% and 44.07%, respectively. The power difference for two polarizations of two output port is less than 1% and 2%, in addition, 40nm and 65nm bandwidth is achieved.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jingjing Zhang, Junbo Yang, Huanyu Lu, Wenjun Wu, Jie Huang, and Shengli Chang "Vertical coupling and polarization-independent subwavelength grating beam splitter based on silicon-on-insulator", Proc. SPIE 9795, Selected Papers of the Photoelectronic Technology Committee Conferences held June–July 2015, 979531 (5 November 2015); https://doi.org/10.1117/12.2209534
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KEYWORDS
Beam splitters

Polarization

Waveguides

Silicon

Etching

Finite-difference time-domain method

Optical design

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