Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering

M. M. Solovan; V. V. Brus; L. J. Pidkamin; P. D. Maryanchuk; Yu. G. Dobrovolsky

doi:10.1117/12.2228981

30 November 2015 Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering

M. M. Solovan, V. V. Brus, L. J. Pidkamin, P. D. Maryanchuk, Yu. G. Dobrovolsky

Author Affiliations +

Proceedings Volume 9809, Twelfth International Conference on Correlation Optics; 980910 (2015) https://doi.org/10.1117/12.2228981
Event: 12th International Conference on Correlation Optics, 2015, Chernivsti, Ukraine

Abstract

We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates.

The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm.

The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.

Citation Download Citation

M. M. Solovan, V. V. Brus, L. J. Pidkamin, P. D. Maryanchuk, and Yu. G. Dobrovolsky "Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering", Proc. SPIE 9809, Twelfth International Conference on Correlation Optics, 980910 (30 November 2015); https://doi.org/10.1117/12.2228981

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