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16 December 1988 Evaluation Of Alternative Mo-Si Multilayer For Soft X-Ray Mirrors By Electron Microscopy And X-Ray Diffraction
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For realizing high-reflection multilayer mirrors, Mo-Si multilayers of 60 layer pairs with layer thicknesses of dSi ≈ 7.3 nm and dMo - 4.0 nm are deposited by magnetron sputter-ing on super-polished Si (100) substrates with rms surface roughness of several tenth of a nm. A typical reflectance value obtained by synchrotron radiation reflectometer using p-polarization radiation was 36 % at an incident angle 10o and a wavelength of λ = 21.0 nm. The structure and crystalline nature of these multilayers have been investigated by X-ray diffraction both at small and wide diffraction angles, transmission electron microscopy for surface and cross-sectional views, and selected area electron diffraction. These results suggest that the Si layers are amorphous whereas the Mo layers are crystalline with [110] axis oriented normal to the substrate. The grain sizes of Mo layers have approximately of the similar size as the film thickness along the direction of the film depth and approxi-mately 10 nm along the film surface. The interfaces also show several tenth to one nm rms roughness probably due to interlayer diffusion or to duplication of the substrate surface roughness. Using the results investigated in this paper, a microscopic structure of Mo-Si multilayer mirror is proposed.
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Shigetaro Ogura, Mas ami Hayashida, Akemi Ishizaki, Yoshiaki Kato, and James L. Wood "Evaluation Of Alternative Mo-Si Multilayer For Soft X-Ray Mirrors By Electron Microscopy And X-Ray Diffraction", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988);

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