Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography

L. Berthod; F. Vocanson; M. Langlet; C. Veillas; S. Reynaud; I. Verrier; J. Laukkanen; O. Parriaux; Y. Jourlin

doi:10.1117/12.2227700

27 April 2016 Direct sub-micron microstructuring on cylinder using TiO₂ sol-gel process and radial phase mask based lithography

L. Berthod, F. Vocanson, M. Langlet, C. Veillas, S. Reynaud, I. Verrier, J. Laukkanen, O. Parriaux, Y. Jourlin

Author Affiliations +

Proceedings Volume 9888, Micro-Optics 2016; 988808 (2016) https://doi.org/10.1117/12.2227700
Event: SPIE Photonics Europe, 2016, Brussels, Belgium

Abstract

Design and fabrication of a high efficiency phase mask have been performed for printing submicron period gratings along 8 mm diameter glass cylinders. In this article, the authors present the radial phase mask specially designed and manufactured for a cylindrical surface micro-structuring under UV photolithography. Its period is sub-micron (480 nm < Λ_PM < 720 nm). The authors describe then the phase mask based UV lithography set-up using the interference between the transmitted beams of +1 and -1 orders generated by the phase mask. Preliminary results of printed gratings on a cylinder are described on a sol-gel TiO₂ thin film layer, enabling direct photo patterning on functionalized layer. The feasibility of a grating printed with a period of Λ_cylin = 960 nm on an 8 mm diameter cylinder with this dedicated mask has been demonstrated.

Citation Download Citation

L. Berthod, F. Vocanson, M. Langlet, C. Veillas, S. Reynaud, I. Verrier, J. Laukkanen, O. Parriaux, and Y. Jourlin "Direct sub-micron microstructuring on cylinder using TiO₂ sol-gel process and radial phase mask based lithography", Proc. SPIE 9888, Micro-Optics 2016, 988808 (27 April 2016); https://doi.org/10.1117/12.2227700

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