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9 November 2016 Near perfect light trapping in 2D metal nanotrench gratings and its application for sensing (Conference Presentation)
Junpeng Guo, Hong Guo, Zhitong Li
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Proceedings Volume 9921, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIV; 992115 (2016) https://doi.org/10.1117/12.2238186
Event: SPIE Nanoscience + Engineering, 2016, San Diego, California, United States
Abstract
In this work, a 2D metallic nano-trench array was fabricated on gold metal surface by using an e-beam lithography patterning and etching process. Optical reflectance from the device was measured at oblique angles of incidence for TE and TM polarization. Near perfect light trapping was observed at different wavelengths for TE and TM polarization at oblique angle of incidence. As angle of incidence increases, light trapping wavelength has a red-shift for TM polarization and blue shift for TE polarization. The fabricated nano-trench device was also investigated for chemical sensor application. It was found that by varying the angle of incidence, the sensitivity changes with opposite trends for TE and TM polarization. Sensor sensitivity increases for TM polarization and decreases for TE polarization with increase of the oblique incident angle.
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Junpeng Guo, Hong Guo, and Zhitong Li "Near perfect light trapping in 2D metal nanotrench gratings and its application for sensing (Conference Presentation)", Proc. SPIE 9921, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIV, 992115 (9 November 2016); https://doi.org/10.1117/12.2238186
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KEYWORDS
Polarization
Metals
Electron beam lithography
Nanolithography
Chemical fiber sensors
Etching
Gold
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