Paper
16 December 1988 Narrow-Band KrF Excimer Laser -- Tunable And Wavelength Stabilized
Koich Wani, Yoshiro Ogata, Yoshiaki Watarai, Takuhiro Ono, Takeo Miyata, Reiji Sano, Yasuaki Terui
Author Affiliations +
Proceedings Volume 0998, Excimer Beam Applications; (1988) https://doi.org/10.1117/12.960201
Event: O-E/Fiber LASE '88, 1988, Boston, MA, United States
Abstract
A tunable and wavelength stabilized KrF excimer laser has been developed. Two Fabry-Perot etalons of 2.4 THz and 170 GHz FSR are placed inside of the laser cavity to reduce the lasing bandwidth to 0.003 nm (3 pm). The wavelength was found to be tunable over a range from 248.1 nm to 248.6 nm. Within this tuning range, a stable wavelength setting to ±0.5 pm was achieved with a feedback system composed of a wavelength detector and a controlling mechanism. This wavelength-stabilized tunable KrF excimer laser will find its applications in optical microlithography, plasma diagnostics and photochemical reactions.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Koich Wani, Yoshiro Ogata, Yoshiaki Watarai, Takuhiro Ono, Takeo Miyata, Reiji Sano, and Yasuaki Terui "Narrow-Band KrF Excimer Laser -- Tunable And Wavelength Stabilized", Proc. SPIE 0998, Excimer Beam Applications, (16 December 1988); https://doi.org/10.1117/12.960201
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications and 21 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Fabry–Perot interferometers

Excimer lasers

Image sensors

Oscillators

Excimers

Laser stabilization

Quartz

RELATED CONTENT

Revisiting F2 laser for DUV microlithography
Proceedings of SPIE (July 26 1999)
The Design Of Excimer Lasers For Use In Microlithography
Proceedings of SPIE (January 01 1988)
Five Watt Industrial Lithography Excimer Laser System
Proceedings of SPIE (October 11 1989)
Improvement of the ArF laser for photolithography
Proceedings of SPIE (May 26 1995)
Excimer lasers for superhigh NA 193-nm lithography
Proceedings of SPIE (June 26 2003)

Back to Top