Optimization design and laser damage threshold analysis of pulse compression multilayer dielectric gratings

Shuwei Fan; Liang Bai; Nana Chen

doi:10.1117/12.2235074

9 August 2016 Optimization design and laser damage threshold analysis of pulse compression multilayer dielectric gratings

Shuwei Fan, Liang Bai, Nana Chen

Author Affiliations +

Proceedings Volume 9983, Pacific Rim Laser Damage 2016: Optical Materials for High-Power Lasers; 998313 (2016) https://doi.org/10.1117/12.2235074
Event: Pacific Rim Laser Damage 2016: Optical Materials for High Power Lasers, 2016, Yokohama, Japan

Abstract

As one of the key elements of high-power laser systems, the pulse compression multilayer dielectric grating is required for broader band, higher diffraction efficiency and higher damage threshold. In this paper, the multilayer dielectric film and the multilayer dielectric gratings(MDG) were designed by eigen matrix and optimized with the help of generic algorithm and rigorous coupled wave method. The reflectivity was close to 100% and the bandwith were over 250nm, twice compared to the unoptimized film structure. The simulation software of standing wave field distribution within MDG was developed and the electric field of the MDG was calculated. And the key parameters which affected the electric field distribution were also studied.

Citation Download Citation

Shuwei Fan, Liang Bai, and Nana Chen "Optimization design and laser damage threshold analysis of pulse compression multilayer dielectric gratings", Proc. SPIE 9983, Pacific Rim Laser Damage 2016: Optical Materials for High-Power Lasers, 998313 (9 August 2016); https://doi.org/10.1117/12.2235074

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