Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume PMJ, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, edited by Nobuyuki Yoshioka, Proceedings of SPIE Vol. 9984 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510603721

Published by

SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA

Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445

SPIE.org

Copyright © 2016, Society of Photo-Optical Instrumentation Engineers.

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/16/$18.00.

Printed in the United States of America.

Publication of record for individual papers is online in the SPIE Digital Library.

00067_psisdg9984_998401_page_2_1.jpg

Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print. Papers are published as they are submitted and meet publication criteria. A unique citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:

  • The first four digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages.

Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Adachi, Takashi, 04

Amano, Tsuyoshi, 0M

Anderson, Christopher N., 0P

Ando, Toshiaki, 0U

Asada, Hironori, 0L

Babin, Sergey, 06

Badger, Karen, 02

Bagge, Patrick, 0G

Ballman, Katherine, 0S

Bean, Alexander, 0S

Bender, Markus, 0N

Beschorner, Klaus, 0U

Borisov, Sergey, 06

Bowhill, Amanda, 0D

Buck, Peter, 0C

Bürgel, Christian, 03

Chalvin, Florian, 0K

Chao, Weilun, 0P

Chen, Chia-Jen, 08

Chen, Chien-Cheng, 08

Chen, Hsuan-Chen, 08

Chen, Yulu, 0G

Choi, Jae-Keun, 0F

Choi, Junyoul, 0W

Choi, Seuk Hwan, 07

Chung, Dong Hoon, 07

Deep, Prakash, 0C

Deng, Erwin, 0D

Deutz, Alex, 0R

Dietze, Uwe, 0U

Dunn, Thomas, 0S

Faure, Thomas, 02

Feicke, Axel, 03

Fujimura, Aki, 0B

Fujimura, Yukihiro, 04

Fukugami, Norihito, 0O

Garetto, Anthony, 09

Goldberg, Kenneth A., 0P

Gullikson, Eric, 0P

Hagihara, Kazuki, 0T

Han, Hak Seung, 07

Han, Yoon Taek, 07

Haraguchi, Takashi, 0O

Hatakeyama, Masahiro, 0M

Hattori, Kiyoshi, 05

Hay, Derrick, 0G

Hayano, Katsuya, 04

Hayashi, Naoya, 0E, 0V

Herrmann, Mark, 03

Hirai, Yoshihiko, 0K

Hirano, Ryoichi, 0M

Hirose, Satoru, 05

Horiuchi, Toshiyuki, 0H, 0I, 0J

Hoshino, Ryoichi, 0L

Hu, Lin, 02

Huang, Cheng-Hsuan, 08

Hwang, Seolchong, 09

Hwang, Sollee, 0F

Iida, Noriko, 0E

Iida, Susumu, 0M

Inazuki, Yukio, 02, 04

Inoue, Hideo, 05

Ishida, Hiroyuki, 0U

Ishida, Shingo, 0U

Isogawa, Takeshi, 02

Ito, Kaiki, 0I

Ito, Shin, 0O

Ito, Yoshiyasu, 0V

Itoh, Masamitsu, 0T, 0V

Jang, Heeyeon, 09

Jeon, Chan-Uk, 07, 0W

Kadota, Kazuya, 0A

Kagawa, Masayuki, 02, 0Q

Kamo, Takashi, 0E

Kanamitsu, Shingo, 0T

Katada, Osamu, 0U

Kawai, Yoshio, 04

Kawanobe, Yoshio, 0U

Kawata, Atsushi, 0L

Kawata, Hiroaki, 0K

Khaw, Ian, 0G

Kim, Byung Gook, 0W

Kim, Dai-Gyoung, 0F

Kim, Jung-Jin, 0W

Kim, Min-Ha, 0F

Kim, Minho, 0W

Kim, Ryoung-han, 0G

Kim, Sangpyo, 09

Kishimura, Yukiko, 0L

Kobayashi, Noa, 0H

Kodera, Yutaka, 0O

Koh, Soowan, 0W

Komagata, Tadashi, 06

Komizo, Toru, 0O

Konishi, Toshio, 0O

Koster, Norbert, 0R

Kotani, Jun, 0O

Lawliss, Mark, 02

Lee, Christopher, 0S

Lee, Gaston, 08

Lee, Han-Shin, 0W

Lee, Hsin-Chang, 08

Lee, Hyung-Joo, 07

Lee, Jiyoung, 0W

Lee, Rachel, 0D

Lee, Youngmo, 09

Liao, Hung-Yueh, 0D

Lien, Ta-Cheng, 08

Lin, Ling-Chieh, 0D

Lin, Ren-Hao, 08

Lin, Roger, 0D

Lobb, Granger, 02

Ma, Shou-Yuan, 0D

Maruyama, Shingo, 0O

Matsumoto, Hiroshi, 05

Matsumoto, Jun, 07

Militsin, Vladimir, 06

Miyashita, Hiroyuki, 04

Molkenboer, Freek, 0R

Morikawa, Yasutaka, 04, 0E

Morita, Hirofumi, 05

Motokawa, Takeharu, 0T

Murakami, Takeshi, 0M

Nakamura, Naoto, 0K

Nakamura, Takayuki, 07

Narita, Eisuke, 0Q

Naulleau, Patrick, 0P

Nesládek, Pavel, 0N

Nishikawa, Kazuhiro, 02

Ochiai, Shunsuke, 0L

Ogasawara, Munehiro, 05

Ogata, Kiyoshi, 0V

Ogiso, Yoshiaki, 07

Oh, Hye-Keun, 0F

Omote, Kazuhiko, 0V

Paninjath, Sankaranarayanan, 0C

Park, Eun-Sang, 0F

Park, Won Joo, 07

Pereira, Mark, 0C

Qi, Zhengqing John, 0G, 0Q

Rankin, Jed, 0Q

Russell, Gordon, 0D

Sagara, Tomoya, 0J

Saito, Masato, 0T

Sakamoto, Yoshifumi, 02

Salmassi, Farhad, 0P

Sasaki, Ryunosuke, 0H

Schedel, Thorsten, 0N

Schmädicke, Cindy, 03

Schulz, Kristian, 09

Seki, Kazunori, 02

Shamsi, Zahid Hussain, 0F

Shi, Zhimin, 0G

Shida, Soichi, 07

Suematsu, Kenichi, 0M

Suenaga, Machiko, 0T

Sun, Lei, 0G

Suzuki, Yuta, 0I

Takahashi, Hiroshi, 0J

Takai, Kosuke, 0E

Takayama, Tomohiro, 0L

Tanabe, Mana, 0T

Tani, Ayako, 04

Taniguchi, Rikiya, 0V

te Sligte, Edwin, 0R

Terao, Kenji, 0M

Tochino, Takamitsu, 0K

Toda, Yusuke, 02

Tsai, Jenny, 0D

Tsai, Joe, 0D

Ueno, Takehiko, 0U

Viswanathan, Ramya, 02

Vu, Hien, 0D

Wakatsuki, Tetsuro, 06

Wang, Alice, 0D

Watanabe, Genta, 0O

Watanabe, Hidehiro, 0M

Willis, Jan, 0B

Wistrom, Richard, 02

Wojdyla, Antoine, 0P

Woo, Sungha, 09

Wood, Obert, 0G

Xu, Yongan, 02

Yagawa, Keisuke, 0T

Yamada, Hirokazu, 05

Yamanaka, Eiji, 0V

Yamashita, Hiroshi, 05

Yang, Chuen-Huei, 0D

Yang, Hyunjo, 09

Yasuda, Masaaki, 0K

Yen, Anthony, 08

Yoshida, Itaru, 0O

Zweber, Amy, 02

Conference Committee

Symposium Chair

  • Toshiyuki Horiuchi, Tokyo Denki University (Japan)

Symposium Vice Chair

  • Masato Shibuya, Tokyo Polytechnic University (Japan)

Advisory Committee Chair

  • Masanori Komuro, High Energy Accelerator Research Organization (Japan)

Advisory Committee

  • Morihisa Hoga, Dai Nippon Printing Company, Ltd. (Japan)

  • Masao Otaki, Consultant (Japan)

  • Tadahiro Takigawa, ALITECS Corporation (Japan)

  • Yoshio Tanaka, D2S, Inc. (United States) and K.K. D2S (Japan)

Organizing Committee Chair

  • Toshiyuki Horiuchi, Tokyo Denki University (Japan)

Organizing Committee Vice Chair

  • Masato Shibuya, Tokyo Polytechnic University (Japan)

Organizing Committee

  • Uwe Behringer, UBC Microelectronics (Germany)

    Parkson Chen, Taiwan Mask Corporation (Taiwan)

    Junko Collins, SEMI Japan (Japan)

    Brian J. Grenon, RAVE, LLC (United States)

    Hideaki Hamada, HTL Company Japan Ltd. (Japan)

    Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

    Eiichi Hoshino, Nikon Corporation (Japan)

    Kunihiro Hosono, Renesas System Design Company, Ltd. (Japan)

    Koji Mikami, Canon Inc. (Japan)

    Hideaki Mitsui, HOYA Corporation (Japan)

    Junji Miyazaki, ASML Japan Company, Ltd. (Japan)

    Warren Montgomery, Colleges of Nanoscale Science and Engineering (United States)

    Ichiro Mori, EUVL Infrastructure Development Center, Inc. (Japan)

    Yoshinori Ouchi, Hitachi High-Tech Science Corporation (Japan)

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Auditors

  • Takehiko Gunji, Sony Semiconductor Corporation (Japan)

  • Yoji Tonooka, Toppan Printing Company, Ltd. (Japan)

Steering Committee Chair

  • Kunihiro Hosono, Renesas System Design Company, Ltd. (Japan)

Steering Committee Vice Chairs

  • Toshio Konishi, Toppan Printing Company, Ltd. (Japan)

  • Hidehiro Watanabe, EUVL Infrastructure Development Center, Inc. (Japan)

Steering Committee

  • Takayuki Abe, NuFlare Technology Inc. (Japan)

    Akihiko Ando, Toshiba Corporation (Japan)

    Naoyuki Ishiwata, FUJITSU Semiconductor Ltd. (Japan)

    Takashi Kamo, Toshiba Corporation (Japan)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

    Yasutaka Morikawa, Dai Nippon Printing Company, Ltd. (Japan)

    Hiroaki Morimoto, Toppan Printing Company, Ltd. (Japan)

    Naoki Nishida, HOYA Corporation (Japan)

    Teruaki Noguchi, JEOL Ltd. (Japan)

    Kiwamu Takehisa, Lasertec Corporation (Japan)

    Hiroyoshi Tanabe, Intel K.K. (Japan)

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Program Committee Chair

  • Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

Program Committee Vice Chairs

  • Akihiko Ando, Toshiba Corporation (Japan)

  • Kiwamu Takehisa, Lasertec Corporation (Japan)

Program Committee

  • Tsukasa Abe, Dai Nippon Printing Company, Ltd. (Japan)

    Hajime Aoyama, Nikon Corporation (Japan)

    Peter Buck, Mentor Graphics Corporation (United States)

    Jeff Farnsworth, Intel Corporation (United States)

    Thomas Faure, GLOBALFOUNDRIES Corporation (United States)

    Kazuyuki Hagiwara, K.K. D2S (Japan)

    Hidemichi Imai, Dai Nippon Printing Company, Ltd. (Japan)

    Ichiro Kagami, Sony Semiconductor Corporation (Japan)

    Franklin Kalk, Toppan Photomasks. Inc. (United States)

    Takashi Kamikubo, NuFlare Technology, Inc. (Japan)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

    Byung-Gook Kim, Samsung Electronics Company, Ltd. (Korea, Republic of)

    Yutaka Kodera, Toppan Printing Company, Ltd. (Japan)

    Yasushi Kojima, Renesas System Design Company, Ltd. (Japan)

    Jun Kotani, Toppan Printing Company, Ltd. (Japan)

    Yasuyuki Kushida, FUJITSU Semiconductor Ltd. (Japan)

    John Lin, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

    Mark Ma, Photronics, Inc. (United States)

    Hironobu Manabe, JEOL Ltd. (Japan)

    Junji Miyazaki, ASML Japan Company, Ltd. (Japan)

    Yoshinori Nagaoka, KLA-Tencor Japan Ltd. (Japan)

    Tsutomu Shoki, HOYA Corporation (Japan)

    Yasunari Sohda, Hitachi, Ltd. (Japan)

    Yasuko Tabata, TowerJazz Panasonic Semiconductor Company, Ltd. (Japan)

    Nobuhiko Yabu, Canon Inc. (Japan)

    Tetsuya Yamamoto, KLA-Tencor Corporation (United States)

Session Chairs

  • 1 FPD Photomasks

    Ichiro Kagami, Sony Semiconductor Corporation (Japan)

    Nobuhiko Yabu, Canon Inc. (Japan)

  • 2 Opening Session

    Nobuyuki Yoshioka, Dai Nippon Printing Company, Ltd. (Japan)

  • 3 Repair

    Akihiko Ando, Toshiba Corporation (Japan)

    Yasushi Kojima, Renesas System Design Company, Ltd. (Japan)

  • 4 Photomask Fabrication Processes

    Jun Kotani, Toppan Printing Company, Ltd. (Japan)

    Hironobu Manabe, JEOL Ltd. (Japan)

  • 5 Writing Technologies

    Uwe Behringer, UBC Microelectronics (Germany)

    Takashi Kamikubo, NuFlare Technology, Inc. (Japan)

  • 6 Metrology

    Klaus-Dieter Roeth, KLA Tencor MIE-Germany (Germany)

    Kiwamu Takehisa, Lasertec Corporation (Japan)

  • 7 EDA, MDP & Lithography

    Peter Buck, Mentor Graphics Corporation (United States)

    Kokoro Kato, Nihon Synopsys G.K. (Japan)

  • 9 EUVL Masks I

    Thomas Faure, GLOBALFOUNDRIS Corporation (United States)

    Tsukasa Abe, Dai Nippon Printing Company, Ltd. (Japan)

  • 10 EUVL Masks II

    Jeff Farnsworth, Intel Corporation (United States)

    Tsutomu Shoki, HOYA Corporation (Japan)

  • 11 EUVL Masks III

    Bryan S. Kasprowicz, Photronics, Inc. (United States)

    Yutaka Kodera, Toppan Printing Company, Ltd. (Japan)

© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 9984", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998401 (7 September 2016); https://doi.org/10.1117/12.2243034
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Extreme ultraviolet lithography

Printing

Electron beam lithography

Nanoimprint lithography

Lithography

Semiconductors

Back to Top