Laser-Scan Lithography onto Ultra-Fine Pipes 100 μm in diameter

Hiroshi Takahashi; Tomoya Sagara; Toshiyuki Horiuchi

doi:10.1117/12.2240158

10 May 2016 Laser-scan lithography onto ultra-fine pipes 100 μm in diameter

Hiroshi Takahashi, Tomoya Sagara, Toshiyuki Horiuchi

Proceedings Volume 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 99840J (2016) https://doi.org/10.1117/12.2240158
Event: Photomask Japan 2016, 2016, Yokohama, Japan

Abstract

It is required to develop a simple but effective method for fabricating micro components with cylindrical shapes such as spring parts used for contact-probe springs of electrical testing systems. Here, laser-scan lithography was researched for printing fine resist patterns used for etching masks on ultra-fine stainless-steel pipes with a diameter of 100 μm. At first, a pipe was coated with 3-μm thick positive resist. Second, the resist is exposed to laser light. As the laser light source, a violet laser with a wavelength of 408 nm was used. The laser beam was reshaped in a circle, and irradiated on the pipe by reducing it in 1/20 using a reduction projection optics composed of a 10X objective lens and a 2X imaging lens. The pipe was supported by the chuck of rotation stage, and exposured by moving it up and down and rotating it. The pipe position was adjusted as the laser spot came on the pipe center using the XY stage. Linearly arrayed 22 slit patterns with a length of 180 μm and a separation of 70μm were printed at each 90° rotation angle. That is, 88 slits in total were delineated at an exposure speed of 110 μm/s.

Citation Download Citation

Hiroshi Takahashi, Tomoya Sagara, and Toshiyuki Horiuchi "Laser-scan lithography onto ultra-fine pipes 100 μm in diameter", Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 99840J (10 May 2016); https://doi.org/10.1117/12.2240158

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