The technical consideration of multi-beam mask writer for production

Sang Hee Lee; Byung-Sup Ahn; Jin Choi; In Kyun Shin; Shuichi Tamamushi; Chan-Uk Jeon

doi:10.1117/12.2243129

3 October 2016 The technical consideration of multi-beam mask writer for production

Sang Hee Lee, Byung-Sup Ahn, Jin Choi, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9985, Photomask Technology 2016; 998506 (2016) https://doi.org/10.1117/12.2243129
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

Multi-beam mask writer is under development to solve the throughput and patterning resolution problems in VSB mask writer. Theoretically, the writing time is appropriate for future design node and the resolution is improved with multi-beam mask writer. Many previous studies show the feasible results of resolution, CD control and registration. Although such technical results of development tool seem to be enough for mass production, there are still many unexpected problems for real mass production. In this report, the technical challenges of multi-beam mask writer are discussed in terms of production and application. The problems and issues are defined based on the performance of current development tool compared with the requirements of mask quality. Using the simulation and experiment, we analyze the specific characteristics of electron beam in multi-beam mask writer scheme. Consequently, we suggest necessary specifications for mass production with multi-beam mask writer in the future.

Citation Download Citation

Sang Hee Lee, Byung-Sup Ahn, Jin Choi, In Kyun Shin, Shuichi Tamamushi, and Chan-Uk Jeon "The technical consideration of multi-beam mask writer for production", Proc. SPIE 9985, Photomask Technology 2016, 998506 (3 October 2016); https://doi.org/10.1117/12.2243129

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