PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
An ERL-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic effects with a higher throughput. An IR-FEL project started at the KEK cERL as a NEDO project in order to develop high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. The IR-FEL was constructed in May 2020 and commissioned in June to July 2020 and in February to March 2021. We will briefly review the EUV-FEL and present the construction and commissioning of the cERL IR-FEL for realizing the EUV-FEL for future lithography.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.