Feasibility study of alternative multilayer for EUV mask

Teiichiro Umezawa; Yohei Ikebe; Naoki Hayase; Takahiro Onoue

doi:10.1117/12.2644225

11 November 2022 Feasibility study of alternative multilayer for EUV mask

Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, Takahiro Onoue

Author Affiliations +

Proceedings Volume PC12293, Photomask Technology 2022; PC122930E (2022) https://doi.org/10.1117/12.2644225
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

The mask 3D effect of the EUV mask is key to implementing a high NA scanner process. This is attributed not only to the absorber but also to the multilayer films. Mo/Si multilayers are widely used for EUV masks. However, it may not have sufficient properties in terms of mask 3D effect. We have developed an alternative multilayer toward application to the high NA system. There are various factors that mask blanks affect wafer productivity. In this report, we evaluated durability performances. These evaluation results on the alternative multilayer will be presented and the next action will be discussed for future production.

Conference Presentation

Citation Download Citation

Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, and Takahiro Onoue "Feasibility study of alternative multilayer for EUV mask", Proc. SPIE PC12293, Photomask Technology 2022, PC122930E (11 November 2022); https://doi.org/10.1117/12.2644225

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