CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12293 > Article
Presentation
11 November 2022 Enabling process optimization for EUV phase shift masks using AIMS® EUV phase metrology
Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, Tim Helbig
Author Affiliations +
Proceedings Volume PC12293, Photomask Technology 2022; PC122930K (2022) https://doi.org/10.1117/12.2645004
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
In the last year, the AIMS® EUV has been extended to applications beyond the native defectivity review, such as the metrology of EUV Phase Shift Masks (PSM). The technology developed for the AIMS® EUV Phase metrology application enables the measurement of the phase difference between the absorber reflected light relative to the light reflected by the multilayer. A reliable information over the mask phase is important for process control in the mask production chain, as well as for the optimization of the wafer exposure process on the scanner. In this paper we will describe the challenges of enabling a precise metrology for the mask phase and will investigate the advantages of employing EUV phase metrology capability as process of record in the mask shop for different engineering and production steps: etch control, imaging optimization and wafer process window enhancement.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, and Tim Helbig "Enabling process optimization for EUV phase shift masks using AIMS® EUV phase metrology", Proc. SPIE PC12293, Photomask Technology 2022, PC122930K (11 November 2022); https://doi.org/10.1117/12.2645004
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Photomasks
Extreme ultraviolet
Metrology
Phase shifts
Phase measurement
Semiconducting wafers
Product engineering
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top