Progress of multi-beam curvilinear mask writing

Christof Zillner; Jakub Jerabek; Amir Moqanaki; Harald Höller-Lugmayr; Elmar Platzgummer

doi:10.1117/12.2643253

31 October 2022 Progress of multi-beam curvilinear mask writing

Christof Zillner, Jakub Jerabek, Amir Moqanaki, Harald Höller-Lugmayr, Elmar Platzgummer

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Proceedings Volume PC12293, Photomask Technology 2022; PC122930M (2022) https://doi.org/10.1117/12.2643253
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

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Abstract

The transition to curvilinear mask ILT might significantly increase layout complexity, posing a substantial challenge for data transfer and storage systems as file sizes explode. Traditionally, multi-beam mask writers (MBMW) have been using a mask data format (OASIS.MBW 1.0/1.2) derived from OASIS P44, leading to multi-terabyte layouts. IMS presented OASIS.MBW 2.1 as an efficient data format for curvilinear ILT masks. Since then, the development has been focused on reducing the file size further while simultaneously ensuring that IT equipment inside the fabs may handle the increased workload as demanded by storage-efficient file formats. In this paper, we propose a further possible solution to the file-format question (OASIS.MBW 2.2) taking into account corrections and requirements of leading-edge most advanced nodes. With that, we collate other file formats and explore their weaknesses and benefits.

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Christof Zillner, Jakub Jerabek, Amir Moqanaki, Harald Höller-Lugmayr, and Elmar Platzgummer "Progress of multi-beam curvilinear mask writing", Proc. SPIE PC12293, Photomask Technology 2022, PC122930M (31 October 2022); https://doi.org/10.1117/12.2643253

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KEYWORDS

Data storage

Extreme ultraviolet

Photomasks

Explosives

Information technology

Optical lithography

Photomask technology

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