Lithography challenges in high quality surface relief gratings for augmented reality application

Yongan Xu

doi:10.1117/12.2688530

22 November 2023 Lithography challenges in high quality surface relief gratings for augmented reality application

Yongan Xu

Proceedings Volume PC12751, Photomask Technology 2023; PC127510A (2023) https://doi.org/10.1117/12.2688530
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

This paper focuses on the application of photolithography, a widely adopted microfabrication technique, in the creation of SRG display. While photolithography is a well-established process, there exist notable challenges in utilizing it for SRG display manufacturing. This work addresses key concerns such as optical proximity correction (OPC), photomask quality, lithography materials, and optimal process conditions for achieving desirable waveguide performance. Moreover, this paper draws a comparison between the patterning requirements and differences in conventional semiconductor lithography and the lithography applied to AR display manufacture. By presenting an in-depth analysis of the intricacies associated with photolithography-based SRG display fabrication, this work aims to provide valuable insights into overcoming technical hurdles and enhancing the overall quality and efficiency of AR waveguide displays.

Conference Presentation

Citation Download Citation

Yongan Xu "Lithography challenges in high quality surface relief gratings for augmented reality application", Proc. SPIE PC12751, Photomask Technology 2023, PC127510A (22 November 2023); https://doi.org/10.1117/12.2688530

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