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13 March 2024 Mode-cleaning effects in graphene oxide-doped microresonators fabricated via two-photon polymerization: a finite-element simulation analysis
Filipe A. Couto, Cleber R. Mendonça
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Proceedings Volume PC12876, Laser 3D Manufacturing XI; PC1287609 (2024) https://doi.org/10.1117/12.3002973
Event: SPIE LASE, 2024, San Francisco, California, United States
Abstract
Two-photon polymerization (2PP) is a well-established method for fabricating 3D photonic microstructures, allowing easy functionalization through photoresist doping. Recently, graphene oxide-doped cylindrical microresonators fabricated via 2PP exhibited a mode-cleaning effect on Whispering Gallery Mode (WGM) resonances. Numerical analysis unveiled that this effect results from non-uniform dopant distribution, leading to distinct levels of attenuation in radial order modes. In this study, we propose an approach to estimate dopant spacial distribution into the structure by analyzing the dopant effects in each individual radial order mode. The absorption coefficient in the structure is modeled as a parametrized function (e.g. Gaussian distribution), and finite-element simulations are carried out to optimize the parameters that best match the experimental data. This methodology provides crucial insights into non-uniform dopant concentration, contributing to a deeper understanding of the mode-cleaning phenomenon and guiding device performance enhancements.
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Filipe A. Couto and Cleber R. Mendonça "Mode-cleaning effects in graphene oxide-doped microresonators fabricated via two-photon polymerization: a finite-element simulation analysis", Proc. SPIE PC12876, Laser 3D Manufacturing XI, PC1287609 (13 March 2024); https://doi.org/10.1117/12.3002973
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KEYWORDS
Microresonators
Two photon polymerization
Absorption
Graphene
Dopants
Resonators
Modeling
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