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13 March 2024 Metalenses for visible wavelengths via NIL volume manufacturing
Matthew C. George, Bradley R. Williams, Daniel Bacon-Brown, Ricky Edwards, Stuart Johnson, Rumyana Petrova, Stew Nielson
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Proceedings Volume PC12897, High Contrast Metastructures XIII; PC128970Q (2024) https://doi.org/10.1117/12.3003756
Event: SPIE OPTO, 2024, San Francisco, California, United States
Abstract
Moxtek has attained the required feature fidelity for visible wavelength metalenses through e-beam lithography based mastering for a Nanoimprint Lithography (NIL) and Nb2O5 etching based manufacturing process. An overcoat is also added to the metalenses, which boosts performance and protects against handling damage. Metalens and associated test structure metrology results including MTF, veiling glare, and efficiency will be presented for various designs spanning the visible wavelength range with NA’s varying from 0.02 to 0.71. Collectively, Moxtek has demonstrated volume manufacturing of metalenses for the visible regime, which was made possible by high precision NIL and Etch processes.
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Matthew C. George, Bradley R. Williams, Daniel Bacon-Brown, Ricky Edwards, Stuart Johnson, Rumyana Petrova, and Stew Nielson "Metalenses for visible wavelengths via NIL volume manufacturing", Proc. SPIE PC12897, High Contrast Metastructures XIII, PC128970Q (13 March 2024); https://doi.org/10.1117/12.3003756
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KEYWORDS
Manufacturing
Metalenses
Nanoimprint lithography
Etching
Electron beam lithography
Metrology
Modulation transfer functions
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