Simulation of fluorescence alignment with atomic-scale precision for ultraviolet nanoimprint lithography

Hiromasa Niinomi

doi:10.1117/12.3012435

26 September 2023 This conference presentation was prepared for Photomask Japan 2023.

Hiromasa Niinomi

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC1291508 (2023) https://doi.org/10.1117/12.3012435
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

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Hiromasa Niinomi "This conference presentation was prepared for Photomask Japan 2023.", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291508 (26 September 2023); https://doi.org/10.1117/12.3012435

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