Multi-height pillars replication from a grayscale resist master by nanoimprint process

Api Warsono; Diana Fernandez Rodas; Jérôme Rêche; Anaïs De Lehelle D'Affroux; Chiara Sabbione

doi:10.1117/12.3014929

10 April 2024 Multi-height pillars replication from a grayscale resist master by nanoimprint process

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle D'Affroux, Chiara Sabbione

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC1295613 (2024) https://doi.org/10.1117/12.3014929
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Nanoimprint Lithography (NIL) remains a versatile technology for replicating optically functional patterns. However, height and roughness conservation over large areas during replication, remains a challenge. In order to identify UV-NIL process capabilities, this study propose to validate the replication of multi-height pillars present on the resist master manufactured by grayscale lithography. Multiple measurement were performed on all pillars before and after replication using profilometry and Atomic Force Microscopy (AFM) to evaluate height and roughness of all patterns. This achievement represents a novel approach to understanding and identifying the capabilities of the UV-NIL process.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle D'Affroux, and Chiara Sabbione "Multi-height pillars replication from a grayscale resist master by nanoimprint process", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC1295613 (10 April 2024); https://doi.org/10.1117/12.3014929

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