Optimizing interfaces of short- and ultrashort W-based multilayers for soft x-rays

Igor A. Makhotkin; Marcelo D. Ackermann; Dennis IJpes; Jacobus M. Sturm; Andrey E. Yakshin

doi:10.1117/12.3029912

4 October 2024 Optimizing interfaces of short- and ultrashort W-based multilayers for soft x-rays

Igor A. Makhotkin, Marcelo D. Ackermann, Dennis IJpes, Jacobus M. Sturm, Andrey E. Yakshin

Proceedings Volume PC13150, Advances in X-Ray/EUV Optics and Components XIX; PC1315002 (2024) https://doi.org/10.1117/12.3029912
Event: Optical Engineering + Applications, 2024, San Diego, California, United States

Abstract

Short- and ultra-short-period multilayer (ML) structures play a crucial role in wavelength dispersive x-ray fluorescence (WD-XRF). In WD-XRF a ML serves as an analyzer crystal to disperse emission lines of light elements in the O-Kα – Al-Kα range (λ=2.36 – 0.834nm). For these reasons, MLs with periods ranging from 1.0 to 2.5nm are very interesting. Due to the short period, the reflectance of such MLs is extremely sensitive to interface imperfections. Our research focuses on synthesis and characterization of MLs with d-spacing between 2.5 nm and 1.0 nm, combining tungsten (W) absorber with B4C, Si and Al spacers. These combinations show high theoretical reflectance in the full range from C-Kα (4.48nm) all the way down to S-Kα (0.54nm). By optimizing the ion polishing process: ion species, energy, and polishing frequency, we show that a major improvement in reflectivity can be achieved: with the most optimal ion polishing process, a factor 2x in reflectivity was achieved for 1.0 and 1.1nm MLs, with a record reflectivity of almost 10% at lambda=0.84nm for 1.1nm W/Si.

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Citation Download Citation

Igor A. Makhotkin, Marcelo D. Ackermann, Dennis IJpes, Jacobus M. Sturm, and Andrey E. Yakshin "Optimizing interfaces of short- and ultrashort W-based multilayers for soft x-rays", Proc. SPIE PC13150, Advances in X-Ray/EUV Optics and Components XIX, PC1315002 (4 October 2024); https://doi.org/10.1117/12.3029912

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KEYWORDS

Reflectivity

Interfaces

Ions

Multilayers

Polishing

X-rays

Barrier layers

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