Advancing EUV lithography optics supporting current roadmap and beyond

Olaf Conradi; Paul Gräupner; Peter Kuerz; Wolfgang Seitz; Jan van Schoot; Roel Moors

doi:10.1117/12.3034698

13 November 2024 Advancing EUV lithography optics supporting current roadmap and beyond

Olaf Conradi, Paul Gräupner, Peter Kuerz, Wolfgang Seitz, Jan van Schoot, Roel Moors

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321503 (2024) https://doi.org/10.1117/12.3034698
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

The optical train is a key element of each lithography scanner. The single patterning resolution limit of a scanner is determined by the characteristics and performance of its imaging system consisting of illumination and projection optics. In this paper, we present status and performance parameters of the next generation “High-NA EUV” optical system. Further, we discuss the current NA 0.33 optical system, where key parameters have been improved to support higher productivity in volume production. Additionally, the EUV roadmap and further progress of our developments will be shown.

Conference Presentation

Citation Download Citation

Olaf Conradi, Paul Gräupner, Peter Kuerz, Wolfgang Seitz, Jan van Schoot, and Roel Moors "Advancing EUV lithography optics supporting current roadmap and beyond", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321503 (13 November 2024); https://doi.org/10.1117/12.3034698

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