Low density diamond-like carbon for pellicle application

Mohammad Saghayezhian; JoJo Daof; Vincent Ip; Katrina Rook; Meng H. Lee; Marjorie Chee; Joshua Park

doi:10.1117/12.3034735

13 November 2024 Low density diamond-like carbon for pellicle application

Mohammad Saghayezhian, JoJo Daof, Vincent Ip, Katrina Rook, Meng H. Lee, Marjorie Chee, Joshua Park

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150G (2024) https://doi.org/10.1117/12.3034735
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

Diamond-like carbon (DLC) is a highly adaptable material that, in thin film form, can have controllable density, band gap, optical constants, and stress, depending on the growth process. Blanket DLC film can be protected against hydrogen erosion by a protective or functional material, which is an advantage over porous material, like carbon nanotubes that require a conformal protective coating for hydrogen protection. Various film growth techniques have been employed to enhance DLC's versatility by reducing density and stress, resulting in improved EUV transmission and stability. Previously, we experimentally demonstrated that film grown using physical vapor deposition is about 23% less dense than the films made by pulsed filtered cathodic arc. Our experimental data indicate that the EUV extinction coefficient decreases equally with density, confirming its direct relation with density. In this work, we used another technique, ion beam deposition (IBD) with hydrocarbon plasma, to grow low-density DLC. Our data show that the extinction coefficient continues to decrease with density, confirming this new pathway for DLC towards a viable blanket material for pellicle applications.

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Mohammad Saghayezhian, JoJo Daof, Vincent Ip, Katrina Rook, Meng H. Lee, Marjorie Chee, and Joshua Park "Low density diamond-like carbon for pellicle application", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150G (13 November 2024); https://doi.org/10.1117/12.3034735

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KEYWORDS

Carbon

Pellicles

Extreme ultraviolet

Carbon nanotubes

Coating stress

Hydrogen

Mass attenuation coefficient

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